High holding high voltage (hhhv) fet for esd protection with modified source and method for producing the same

ABSTRACT

A method of forming a LDMOS with a self-aligned P+ implant and LVPW region at the source side and the resulting device are provided. Embodiments include forming a DNWELL in a p-sub; forming a PWHV in the DNWELL; forming an NW in the DNWELL; forming a LVPW in the PWHV; forming STI structures through the LVPW and through the DNWELL and NW, respectively; forming a gate over the PWHV; forming a first and a second P+ implant in the LVPW, an edge of the second P+ implant aligned with an edge of the gate; forming a first N+ implant in the LVPW between the first STI structure and the second P+ implant and a second N+ in the NW adjacent to the second STI structure; and forming contacts over the first and second P+ and N+ implants, respectively, and an electrical contact over the second N+ implant.

TECHNICAL FIELD

The present disclosure relates to electrostatic discharge (ESD)protection devices. The present disclosure is particularly applicable toa high holding high voltage (HHHV) field-effect transistor (FET).

BACKGROUND

ESD impact on production yield and product quality is increasinglybecoming more significant due to requirements for higher speeds anddevice scaling. In general, ESD protection devices work by providing apath through the integrated circuit (IC) that has high current shuntingcapabilities. High holding voltage (V_(H)) enables latch-up safeoperation of such devices. However, known high voltage (HV)gate-grounded N-channel metal oxide semiconductor (GGNMOS) clampsexhibit low V_(H), e.g., below drain voltage (V_(VDD)). In addition,known solutions fail to provide designers with the ability toefficiently control/scale V_(H) without comprising the device area.

A need therefore exists for methodology enabling formation of an ESDdevice that exhibits high V_(H) and enables efficient control of V_(t1)and V_(H) without compromising the device area and the resulting device.

SUMMARY

An aspect of the present disclosure is a process of forming a laterallydiffused metal oxide semiconductor (LDMOS) with an additionalself-aligned p-type (P+) implant and a second body well (low-voltagep-well (LVPW)) region at the source side of the device.

Another aspect of the present disclosure is a LDMOS with an additionalself-aligned P+ implant and a LVPW region at the source side of thedevice.

Additional aspects and other features of the present disclosure will beset forth in the description which follows and in part will be apparentto those having ordinary skill in the art upon examination of thefollowing or may be learned from the practice of the present disclosure.The advantages of the present disclosure may be realized and obtained asparticularly pointed out in the appended claims.

According to the present disclosure, some technical effects may beachieved in part by a method including: forming an n-doped well (DNWELL)region in a portion of a p-type substrate (p-sub); forming a highvoltage p-well (PWHV) region in a portion of the DNWELL region; formingan n-well (NW) laterally separated from the PWHV region in a portion ofthe DNWELL region; forming a LVPW region in a portion of the PWHVregion; forming a first and a second shallow trench isolation (STI)structure through a portion of the LVPW region and through a portion ofthe DNWELL region and NW, respectively; forming a gate over the PWHVregion; forming a first and a second P+ implant laterally separated in aportion of the LVPW region, an edge of the second P+ implant alignedwith an edge of the gate; forming a first n-type (N+) implant in theLVPW region between and adjacent to the first STI structure and thesecond P+ implant and a second N+ in the NW adjacent to the second STIstructure; and forming a first and a second contact over the first andsecond P+ and N+ implants, respectively, and an electrical contact overthe second N+ implant.

Aspects of the present disclosure include forming the LVPW region withan edge extended a distance past an edge of the second P+ implant andunder a portion of the gate. Other aspects include the distance being0.3 micrometer (μm) to 1.5 μm. Further aspects include forming the LVPWregion with an edge terminated a distance before an edge of the secondP+ implant closest to the gate. Another aspect includes the distancebeing 0.1 μm to 0.3 μm. Additional aspects include forming a contactover each of the first and second N+ and P+ implants, respectively; andforming an electrical contact over the second N+ implant. Other aspectsinclude forming first, second, and third STI structures laterallyseparated through a portion of the p-sub, the p-sub and DNWELL region,and the DNWELL, PWHV, and LVPW regions, respectively, wherein an edge ofthe third STI structure is adjacent to the first P+ implant; forming aP+ implant in a portion of the p-sub between and adjacent to the firstand second STI structures; forming an N+ implant in a portion of theDNWELL region between and adjacent to the second and third STIstructures; and forming a fourth STI structure through a portion of thep-sub and DNWELL region and adjacent to the NW and second N+ implant.Further aspects include forming a contact over each of the P+ and N+implants. Additional aspects include forming a gate dielectric layerover respective portions of the PWHV and DNWELL regions prior to theforming of the gate.

Another aspect of the present disclosure is a device including: a DNWELLregion in a portion of a p-sub; a PWHV region in a portion of the DNWELLregion; an NW laterally separated from the PWHV region in a portion ofthe DNWELL region; a LVPW region in a portion of the PWHV region; afirst and a second P+ implant laterally separated and a first N+ implantbetween the first and second P+ implants in a portion of the LVPWregion; a second N+ implant in a portion of the NW; a first STIstructure through a portion of the LVPW region between and adjacent tothe first P+ implant and the first N+ implant; a second STI structurethrough a portion of the DNWELL region and NW; and a gate over the PWHVregion having an edge aligned with an edge of the second P+ implant.

Aspects of the device include an edge of the LVPW region extending adistance past an edge of the second P+ implant and being under a portionof the gate. Other aspects include the distance being 0.3 μm to 1.5 μm.Further aspects include an edge of the LVPW region terminating adistance before an edge of the second P+ implant closest to the gate.Additional aspects include the distance being 0.1 μm to 0.3 μm. Anotheraspect includes a contact over each of the first and second N+ and P+implants, respectively; and an electrical contact over the second N+implant. Other aspects include first, second, and third STI structureslaterally separated through a portion of the p-sub, the p-sub and DNWELLregion, and the DNWELL, PWHV, and LVPW regions, respectively, wherein anedge of the third STI structure is adjacent to the first P+ implant; aP+ implant in a portion of the p-sub between and adjacent to the firstand second STI structures; an N+ implant in a portion of the DNWELLregion between and adjacent to the second and third STI structures; anda fourth STI structure through a portion of the p-sub and DNWELL regionand adjacent to the NW and second N+ implant. Further aspects include acontact over each of the P+ and N+ implants. Another aspect includes agate dielectric layer between the PWHV and DNWELL regions and the gate.

A further aspect of the present disclosure is a method including:forming a DNWELL region in a portion of a p-sub; forming a PWHV regionin a portion of the DNWELL region; forming an NW laterally separatedfrom the PWHV region in a portion of the DNWELL region; forming a LVPWregion in a portion of the PWHV region; forming a first and a second P+implant laterally separated in a portion of the LVPW region and a firstN+ implant between the first and second P+ implants; forming a second N+implant in a portion of the NW; forming a first STI structure through aportion of the LVPW region between and adjacent to the first P+ implantand the first N+ implant and a second STI through a portion of the N+implant, NW, and DNWELL region; and forming a gate over the PWHV regionhaving an edge aligned with an edge of the second P+ implant and theedge of the gate being over an edge of the LVPW region. Aspects of thepresent disclosure include a distance between the edge of the second P+implant and the edge of the LVPW region being 0.3 μm to 1.5 μm.

Additional aspects and technical effects of the present disclosure willbecome readily apparent to those skilled in the art from the followingdetailed description wherein embodiments of the present disclosure aredescribed simply by way of illustration of the best mode contemplated tocarry out the present disclosure. As will be realized, the presentdisclosure is capable of other and different embodiments, and itsseveral details are capable of modifications in various obviousrespects, all without departing from the present disclosure.Accordingly, the drawings and description are to be regarded asillustrative in nature, and not as restrictive.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is illustrated by way of example, and not by wayof limitation, in the figures of the accompanying drawing and in whichlike reference numerals refer to similar elements and in which:

FIG. 1 schematically illustrates a cross-sectional view of a LDMOStransistor with an additional self-aligned P+ implant and a LVPW regionat the source side of the device, in accordance with an exemplaryembodiment;

FIG. 2 schematically illustrates the principle underlying the ESDoperation of the LDMOS transistor of FIG. 1; and

FIG. 3 schematically illustrates a cross-sectional view of a LDMOS withan additional self-aligned P+ implant and a “pulled-back” LVPW region atthe source side of the device, in accordance with an exemplaryembodiment.

DETAILED DESCRIPTION

In the following description, for the purposes of explanation, numerousspecific details are set forth in order to provide a thoroughunderstanding of exemplary embodiments. It should be apparent, however,that exemplary embodiments may be practiced without these specificdetails or with an equivalent arrangement. In other instances,well-known structures and devices are shown in block diagram form inorder to avoid unnecessarily obscuring exemplary embodiments. Inaddition, unless otherwise indicated, all numbers expressing quantities,ratios, and numerical properties of ingredients, reaction conditions,and so forth used in the specification and claims are to be understoodas being modified in all instances by the term “about.”

The present disclosure addresses and solves the current problems ofknown ESD protection solutions exhibiting low V_(H) and, therefore, notbeing latch-up safe, and compromising device area to efficientlycontrol/scale V_(t1) and V_(H) attendant upon forming a HV ESDprotection device. The problems are solved, inter alia, by adding aself-aligned P+ implant and a LVPW region at the source side of a LDMOS.

Methodology in accordance with embodiments of the present disclosureincludes forming a DNWELL region in a portion of a p-sub. A PWHV regionis formed in a portion of the DNWELL region. An NW laterally separatedfrom the PWHV region is formed in a portion of the DNWELL region. A LVPWregion is formed in a portion of the PWHV region. A first and a secondSTI structure are formed through a portion of the LVPW region andthrough a portion of the DNWELL region and NW, respectively. A gate isformed over the PWHV and DNWELL regions and a first and a second P+implant laterally separated are formed in a portion of the LVPW region,an edge of the second P+ implant aligned with an edge of the gate. Afirst N+ implant is formed in the LVPW region between and adjacent tothe first STI structure and the second P+ implant and a second N+ in theNW adjacent to the second STI structure. A first and a second contactare formed over the first and second P+ and N+ implants, respectively,and an electrical contact is formed over the second N+ implant.

Still other aspects, features, and technical effects will be readilyapparent to those skilled in this art from the following detaileddescription, wherein preferred embodiments are shown and described,simply by way of illustration of the best mode contemplated. Thedisclosure is capable of other and different embodiments, and itsseveral details are capable of modifications in various obviousrespects. Accordingly, the drawings and description are to be regardedas illustrative in nature, and not as restrictive.

FIG. 1 schematically illustrates a cross-sectional view of a LDMOStransistor with an additional self-aligned P+ implant and a LVPW regionat the source side of the device, in accordance with an exemplaryembodiment. Referring to FIG. 1, a DNWELL region 101 is formed in aportion of a p-sub 103. A PWHV region 105 is formed in a portion of theDNWELL region 101 on the source side of the device. A NW 107 laterallyseparated from the PWHV region 105 is formed in a portion of the DNWELLregion 101. A LVPW region 109 is formed, e.g., by a boron ionimplantation at a dosage, e.g., of 1 e17 per centimeter cubed (cm³) to 1e19 cm³, in a portion of the PWHV region 105. STI structures 111 and 113are formed laterally separated through a portion of the LVPW region 109and through a portion of the DNWELL region 101 and NW 107, respectively.STI structures 115, 117, 119, and 121 are likewise formed through aportion of the p-sub 103; the p-sub 103 and DNWELL region 101; theDNWELL region 101, PWHV region 105, and LVPW region 109; and the p-sub103 and the DNWELL region 101, respectively.

A gate 123 is formed, e.g., of polysilicon, over a gate dielectric layer125 formed over respective portions of the PWHV and DNWELL regions 105and 101, respectively. P+ implants 127 and 129 and an N+ implant 131 areformed in a portion of the LVPW region 109. In particular, the edge ofthe silicided P+ implant 129 is self-aligned with the edge of the gate123. The doping concentration used to form the P+ implant 129 is greaterthan the doping concentration used to form the LVPW region 109, which isgreater than the doping concentration used to form the PWHV region 105.Further, the LVPW region 109 is formed with an edge extending, e.g., 0.3μm to 1.5 μm (distance 133), past the edge of the P+ implant 129 andunder a portion of the gate 123. It should be noted; however, that thedistance 133 also depends on the length of the gate 123 and for smallergate lengths, the distance 133 should be closer to the lower limit of0.3 μm and away from the upper limit of 1.5 μm. It should also be notedthat the range of distance 133 is provided for illustration based onexperimentation and is not intended as a limitation. A P+ implant 135and an N+ implant 137 are formed in a portion of the p-sub 103 andDNWELL region 101, respectively, and an N+ implant 139 is formed abovethe NW 107. In addition contacts 141 are formed over the P+ implant 135,N+ implant 137, P+ implant 127, and N+ and P+ implants 131 and 129,respectively. Further, an electrical contact 143 is formed over the N+implant 139.

FIG. 2 schematically illustrates the principle underlying the ESDoperation of the LDMOS transistor of FIG. 1. Referring to FIG. 2, thebulk resistance (R_(B)) of the device is reduced as a result of thehigher concentration (R_(B1)) (line 201) of the LVPW region 109 and thepresence of the P+ stripe 129 (R_(B2)) (line 203). In addition, for aconstant base current (I_(B)) (generated by avalanche of Drain-Body),the voltage that falls between the base and emitter of a bipolarjunction transistor (V_(BE)) is reduced along with the beta of the NPNtransistor (β_(NPN)). In particular, β_(NPN) is reduced due to a higherrecombination of minority carriers in the base. Consequently, the V_(H)of the device of FIG. 1 is increased.

FIG. 3 schematically illustrates a cross-sectional view of a LDMOS withan additional self-aligned P+ implant and a “pulled-back” LVPW region atthe source side of the device, in accordance with an exemplaryembodiment. The device of FIG. 3 is nearly identical to the device ofFIG. 1, except in this instance, a LVPW region 301 is formed with anedge terminating, e.g., 0.1 μm to 0.3 μm (distance 303), away from anedge of the P+ implant 129 closest to the gate 123, i.e., the LVPWregion 301 underlaps the P+ implant 129. In contrast, an edge of theLVPW region 109 of FIG. 1 extends past the edge of the P+ implant 129and under a portion of the gate 123. Again, it should be noted that therange of distance 303 is provided for illustration based onexperimentation and is not intended as a limitation.

The embodiments of the present disclosure can achieve several technicaleffects including improved V_(H) and efficient control of V_(t1) andV_(H) without compromising the device area or requiring additionalmasks. In addition, reverse protection capability (body-drain diode) ismaintained along with tight dispersion (stable without process).Further, as compared to known processes, e.g., gate length (L_(G))up-scaling and adding more body contacts, similar or greater currentdensity/area is obtained. Embodiments of the present disclosure enjoyutility in various industrial applications as, for example,microprocessors, smart phones, mobile phones, cellular handsets, set-topboxes, DVD recorders and players, automotive navigation, printers andperipherals, networking and telecom equipment, gaming systems, anddigital cameras. The present disclosure enjoys industrial applicabilityin any of various types of highly integrated semiconductor devicesincluding HHHV FETs.

In the preceding description, the present disclosure is described withreference to specifically exemplary embodiments thereof. It will,however, be evident that various modifications and changes may be madethereto without departing from the broader spirit and scope of thepresent disclosure, as set forth in the claims. The specification anddrawings are, accordingly, to be regarded as illustrative and not asrestrictive. It is understood that the present disclosure is capable ofusing various other combinations and embodiments and is capable of anychanges or modifications within the scope of the inventive concept asexpressed herein.

What is claimed is:
 1. A method comprising: forming an n-doped well(DNWELL) region in a portion of a p-type substrate (p-sub); forming ahigh voltage p-well (PWHV) region in a portion of the DNWELL region;forming an n-well (NW) laterally separated from the PWHV region in aportion of the DNWELL region; forming a low-voltage p-well (LVPW) regionin a portion of the PWHV region; forming a first and a second shallowtrench isolation (STI) structure through a portion of the LVPW regionand through a portion of the DNWELL region and NW, respectively; forminga gate over the p-sub; forming a first and a second p-type (P+) implantlaterally separated in a portion of the LVPW region, an edge of thesecond P+ implant aligned with an edge of the gate; forming a firstn-type (N+) implant in the LVPW region between and adjacent to the firstSTI structure and the second P+ implant and a second N+ in the NWadjacent to the second STI structure; and forming a first and a secondcontact over the first and second P+ and N+ implants, respectively, andan electrical contact over the second N+ implant.
 2. The methodaccording to claim 1, comprising forming the LVPW region with an edgeextended a distance past an edge of the second P+ implant and under aportion of the gate.
 3. The method according to claim 2, wherein thedistance comprises 0.3 micrometer (μm) to 1.5 μm.
 4. The methodaccording to claim 1, comprising forming the LVPW region with an edgeterminated a distance before an edge of the second P+ implant closest tothe gate.
 5. The method according to claim 4, wherein the distancecomprises 0.1 μm to 0.3 μm.
 6. The method according to claim 1, furthercomprising: forming a contact over each of the first and second N+ andP+ implants, respectively; and forming an electrical contact over thesecond N+ implant.
 7. The method according to claim 1, furthercomprising: forming first, second, and third STI structures laterallyseparated through a portion of the p-sub, the p-sub and DNWELL region,and the DNWELL, PWHV, and LVPW regions, respectively, wherein an edge ofthe third STI structure is adjacent to the first P+ implant; forming aP+ implant in a portion of the p-sub between and adjacent to the firstand second STI structures; forming an N+ implant in a portion of theDNWELL region between and adjacent to the second and third STIstructures; and forming a fourth STI structure through a portion of thep-sub and DNWELL region and adjacent to the NW and second N+ implant. 8.The method according to claim 7, comprising forming a contact over eachof the P+ and N+ implants.
 9. The method according to claim 1, furthercomprising forming a gate dielectric layer over respective portions ofthe PWHV and DNWELL regions prior to the forming of the gate.
 10. Adevice comprising: an n-doped well (DNWELL) region in a portion of ap-type substrate (p-sub); a high voltage p-well (PWHV) region in aportion of the DNWELL region; an n-well (NW) laterally separated fromthe PWHV region in a portion of the DNWELL region; a low-voltage p-well(LVPW) region in a portion of the PWHV region; a first and a secondp-type (P+) implant laterally separated and a first n-type (N+) implantbetween the first and second P+ implants in a portion of the LVPWregion; a second N+ implant in a portion of the NW; a first shallowtrench isolation (STI) structure through a portion of the LVPW regionbetween and adjacent to the first P+ implant and the first N+ implant; asecond STI structure through a portion of the DNWELL region and NW; anda gate over the PWHV region having an edge aligned with an edge of thesecond P+ implant.
 11. The device according to claim 10, wherein an edgeof the LVPW region extends a distance past an edge of the second P+implant and is under a portion of the gate.
 12. The device according toclaim 11, wherein the distance comprises 0.3 micrometer (μm) to 1.5 μm.13. The device according to claim 10, wherein an edge of the LVPW regionterminates a distance before an edge of the second P+ implant closest tothe gate.
 14. The device according to claim 13, wherein the distancecomprises 0.1 μm to 0.3 μm.
 15. The device according to claim 10,further comprising: a contact over each of the first and second N+ andP+ implants, respectively; and an electrical contact over the second N+implant.
 16. The device according to claim 10, further comprising:first, second, and third STI structures laterally separated through aportion of the p-sub, the p-sub and DNWELL region, and the DNWELL, PWHV,and LVPW regions, respectively, wherein an edge of the third STIstructure is adjacent to the first P+ implant; a P+ implant in a portionof the p-sub between and adjacent to the first and second STIstructures; an N+ implant in a portion of the DNWELL region between andadjacent to the second and third STI structures; and a fourth STIstructure through a portion of the p-sub and DNWELL region and adjacentto the NW and second N+ implant.
 17. The device according to claim 16,comprising: a contact over each of the P+ and N+ implants.
 18. Thedevice according to claim 10, further comprising: a gate dielectriclayer between the PWHV and DNWELL regions and the gate.
 19. A methodcomprising: forming an n-doped well (DNWELL) region in a portion of ap-type substrate (p-sub); forming a high voltage p-well (PWHV) region ina portion of the DNWELL region; forming an n-well (NW) laterallyseparated from the PWHV region in a portion of the DNWELL region;forming a low-voltage p-well (LVPW) region in a portion of the PWHVregion; forming a first and a second p-type (P+) implant laterallyseparated in a portion of the LVPW region and a first n-type (N+)implant between the first and second P+ implants; forming a second N+implant in a portion of the NW; forming a first shallow trench isolation(STI) structure through a portion of the LVPW region between andadjacent to the first P+ implant and the first N+ implant and a secondSTI through a portion of the N+ implant, NW, and DNWELL region; andforming a gate over the PWHV region having an edge aligned with an edgeof the second P+ implant and the edge of the gate being over an edge ofthe LVPW region.
 20. The method according to claim 19, wherein adistance between the edge of the second P+ implant and the edge of theLVPW region comprises 0.3 micrometer (μm) to 1.5 μm.